Influence of plating parameters and solution chemistry on the voiding propensity at electroplated copper–solder interface

作者: Y. Liu , J. Wang , L. Yin , P. Kondos , C. Parks

DOI: 10.1007/S10800-008-9618-Z

关键词:

摘要: … with Cu plated in the presence of an unspecified additive in comparison with “no additive” … A GPS was formulated in our lab to consist of 0.26 M CuSO 4 · 5H 2 O (Sigma-Aldrich), 2 MH 2 …

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