Hybrid nanolaminate dielectrics engineered for frequency and bias stability
作者： S. K. Sahoo , R. P. Patel , C. A. Wolden
DOI: 10.1063/1.4818831
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摘要: Metal-insulator-metal capacitors were fabricated from hybrid alumina-silicone nanolaminates deposited by plasma-enhanced chemical vapor deposition. These two materials have complementary properties that produce dielectrics are exceptionally stable with respect to frequency and dc bias. 50% displayed low dielectric loss (tan δ = 0.04) a negligible quadratic voltage coefficient (α = 7 ppm/V2). Both of these values improved over the individual components. This performance was achieved in 165 nm thick films provide both high specific capacitance (30 nF/cm2) extremely leakage (∼10−9 A/cm2 at 1 MV/cm).
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