Growth defects in CrN/NbN coatings deposited by HIPIMS/UBM techniques

摘要: In recent years, high power impulse magnetron sputtering (HIPIMS) has caught the attention of users due to its ability produce dense coatings. However, microscopic studies have shown that HIPIMS deposited coatings can suffer from some surface imperfections even though overall number defects be significantly lower compared to, for example, arc similar thickness. Defects degrade coating performance thus any kind defect is undesirable. To better understand nature these and science their formation, three sets chromium nitride/niobium nitride (CrN/NbN) were using technique combined with unbalanced (UBM) by varying deposition parameters, i.e. time (t = 15 120 min), bias voltage (Ub - 40 150 V) chamber pressure (P 0.2 1 Pa). For each set, one parameter was varied other two kept constant. All experiments carried out conditions close those found in industrial environment. The study revealed generated all increase time/bias voltage/chamber area covered optically visible (surface density) increased. These categorised as flakes related (nodular, open void cone-like defects) associated substrate pits (pinhole defects). Depending on types, influenced corrosion tribological properties As origins most (generated components), an additional conducted influence cleanliness generation. expected, density produced a comparatively clean reduced noticeably (from 3.18 % 1.37 after cleaning). Coatings performed well during tests. comparison between pure UBM HIPIMS/UBM suggested along defects, structure also had major role corrosion, wear friction mechanisms. Even where showed higher owing microstructures, resistance behaviour superior