Ion implanted standards for secondary ion mass spectrometric determination of the Group IA-VIIA elements in semiconducting matrixes

作者: D. P. Leta , G. H. Morrison

DOI: 10.1021/AC50053A032

关键词:

摘要:

参考文章(11)
W.H. Gries, Quantitative ion implantation: Theoretical aspects International Journal of Mass Spectrometry and Ion Physics. ,vol. 30, pp. 97- 112 ,(1979) , 10.1016/0020-7381(79)80088-1
H. B. Dietrich, W. H. Weisenberger, J. Comas, Anomalous migration of ion‐implanted Al in Si Applied Physics Letters. ,vol. 28, pp. 182- 184 ,(1976) , 10.1063/1.88716
W. K. Hofker, H. W. Werner, D. P. Oosthoek, H. A. M. de Grefte, Influence of Annealing on the Concentration Profiles of Boron Implantations in Silicon Applied physics. ,vol. 2, pp. 265- 278 ,(1973) , 10.1007/BF00889509
D. P. Leta, G. H. Morrison, Ion implantation for in-situ quantitative ion microprobe analysis Analytical Chemistry. ,vol. 52, pp. 277- 280 ,(1980) , 10.1021/AC50052A015
N. Shimizu, M.P. Semet, C.J. Allègre, Geochemical applications of quantitative ion-microprobe analysis Geochimica et Cosmochimica Acta. ,vol. 42, pp. 1321- 1334 ,(1978) , 10.1016/0016-7037(78)90037-6
D.S. Flett, J.A. Hartlage, D.R. Spink, D.N. Okuhara, The extraction of copper by an alkylated 8-hydroxy quinoline Journal of Inorganic and Nuclear Chemistry. ,vol. 37, pp. 1967- 1971 ,(1975) , 10.1016/0022-1902(75)80926-2
G. J. Scilla, G. H. Morrison, Sampling error in ion microprobe analysis Analytical Chemistry. ,vol. 49, pp. 1529- 1536 ,(1977) , 10.1021/AC50019A017
Stephen P. Carter, Henry. Freiser, Apparatus for following extraction kinetics Analytical Chemistry. ,vol. 51, pp. 1100- 1101 ,(1979) , 10.1021/AC50043A080
V. R. Deline, C. A. Evans, Peter Williams, A unified explanation for secondary ion yields Applied Physics Letters. ,vol. 33, pp. 578- 580 ,(1978) , 10.1063/1.90466