Investigation of structural and optical properties of sputtered Zirconia thin films
作者： F. Rebib , N. Laidani , G. Gottardi , V. Micheli , R. Bartali
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摘要: Zirconium oxide thin films were deposited by sputtering a ZrO 2 target under an argon-oxygen gas mixture and different total pressures. Their composition, structure optical constants characterised mean of Auger profiles, XRD, XPS, m-line UV-visible spectroscopies. All the deposits found to be sub-stoechiometric with O/Zr ratio decreasing from 1.6 1.45 when deposition pressure increased 0.01 0.05 Torr. A SRIM simulation was used explain this behaviour. The XRD showed monoclinic phase for all sample grain size residual stress. Finally, determined. refractive index decreased slightly whereas gap Urbach energy quite constant whatever pressure.
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