作者: Wakana Hara , Jin Liu , Atsushi Sasaki , Sei Otaka , Norihiro Tateda
DOI: 10.1016/J.TSF.2007.05.070
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摘要: Abstract We have fabricated epitaxial AlN thin films at room temperature on sapphire (0001) substrates with a TiN (111) buffer layer by pulsed laser deposition in ultra-high vacuum (laser molecular beam epitaxy method). The layers were also temperature. Four-circle X-ray diffraction analysis and reflection high-energy electron results indicate the heteroepitaxial structure of (0001)/TiN (111)/sapphire relationship [10–10]||TiN [11–2]||sapphire [11–20]. surface room-temperature grown film was found to be atomically flat, reflecting nano-stepped ultrasmooth substrates. Then, we could achieve growth [AlN/TiN] multi-layer. dependence resistivity AlN/TiN multi-layer measured.