Enhancement of the NO2-sensing capability of copper phthalocyanine by measuring the realtive resistance change
作者： Chul Park , Dong Hyun Yun , Sung-Tae Kim , Yung Woo Park
DOI: 10.1016/0925-4005(95)01727-D
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摘要: Abstract The gas-sensing properties of copper phthalocyanine (CuPc) thin films have been measured for NO 2 concentrations 1 to 10 parts per million (ppm). CuPc thermally evaporated on glass substrates appear an α-form polycrystalline structure. Most measurements gas sensitivity are done with heat-cleaned sensing elements reduce the instability resistance. We established unambiguously that a significant enhancement detectivity can be accomplished by converting resistance normalized figure, i.e., relative Good as low ppm has reproducibly achieved.
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