作者: Gregory K.L. Goh , Cheryl P.K. Liew , Jean Kim , Tim J. White
DOI: 10.1016/J.JCRYSGRO.2006.02.029
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摘要: Abstract TiO 2 films were deposited on silica glass substrates at 60 °C from an aqueous acidic solution of TiCl 4 . The lattice the precipitated material was expanded and is believed to have been caused by incorporation protons, due incomplete dehydration. Rietveld refinement revealed that rutile nano-sized it made up only 29% , rest being amorphous Particles embedded in film significantly reduced its transparency. Reasonably transparent obtained when introduction suspended substrate delayed until particles had grown sufficiently large enough settle bottom reactor. refractive index determined envelope method 2.4. This higher than previously reported values for also comparable vapor deposition methods. high result a packing density much reported.