Influence of deposition conditions on the microstructure of oxides thin films
作者： Guanglei Tian , Shigang Wu , Kangying Shu , Laishun Qin , Jianda Shao
DOI: 10.1016/J.APSUSC.2007.04.073
关键词:
摘要: Thin films of ZrO2, HfO2 and TiO2 were deposited on kinds substrates by electron beam evaporation (EB), ion assisted deposition (IAD) dual sputtering (DIBS). Then some them annealed at different temperatures. X-ray diffraction (XRD) was applied to determine the crystalline phase grain size these films, results revealed that their microstructures strongly depended conditions such as substrate, temperature, method annealing temperature. Theory crystal growth migratory diffusion explain difference structures between thin treated under various conditions. (c) 2007 Elsevier B.V. All rights reserved.
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