作者: MM Hasan , AS Haseeb , Rahman Saidur , Haji Hassan Masjuki , M Hamdi
DOI: 10.3923/JAS.2009.2815.2821
关键词:
摘要: In this investigation, anatase TiO 2 thin films were deposited on glass substrates at room temperature by RF magnetron sputtering an elevated pressure of 3 Pa. The annealed different temperatures up to 873°K for 1 h. characterized X-Ray Diffraction (XRD), Field-Emission Scanning Electron Microscopy (FESEM). Atomic Force (AFM) and UV-visible-NIR spectrophotometry. XRD results reveal that the as-deposited film possess structure. Annealed show insignificant change in crystallinity except fact there is a slight increase 600°C. crystallite size increases from 44.5 48 nm with annealing temperature. As-grown exhibits high visible transmittance enhanced refractive index 2.31 wavelength 550 nm. indirect optical band gaps have been estimated be range 3.39-3.42 eV. AFM observations compact dense morphology films.