Properties of HfO2 thin films prepared by dual-ion-beam reactive sputtering
作者： Dongping Zhang , Ping Fan , Congjuan Wang , Xingmin Cai , Guangxing Liang
DOI: 10.1016/J.OPTLASTEC.2008.11.010
关键词:
摘要: Abstract HfO2 thin films were prepared in dual-ion-beam reactive sputtering (DIBRS) method. Spectrophotometer, surface thermal lensing (STL) technique, Rutherford backscattering (RBS), and X-ray diffraction (XRD) employed measuring the transmittance, absorptance, stoichiometry, microstructure, respectively. Experimental results indicate that peak transmittance value of sample is about 90%. Weak absorptance measurement for 1064 nm wavelength laser by STL technique investigated absorption 180 ppm as-grown sample, which larger than expected. Substoichiometry main cause could be proved RBS annealing test results. XRD result shows are polycrystalline, monoclinic dominant phase.
core.ac.uk
harvard.edu
elsevier.com
sci-hub.se 参考文章(18)
James Y. Wang, Dinesh K. Sood, Muralidhar K. Ghantasala, Nick Dytlewski, Characterization of sputtered SmCo thin films for light element contamination using RBS and HIERDA techniques Vacuum. ,vol. 75, pp. 17- 23 ,(2004) , 10.1016/J.VACUUM.2003.12.130
C. Morant, P. Prieto, J. Bareño, J.M. Sanz, E. Elizalde, Hard BCxNy thin films grown by dual ion beam sputtering Thin Solid Films. ,vol. 515, pp. 207- 211 ,(2006) , 10.1016/J.TSF.2005.12.063
Zhouling Wu, Pao-Kuang Kuo, Y. S. Lu, S. T. Gu, Laser-induced surface thermal lensing for thin film characterizations 27th Annual Boulder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995. ,vol. 2714, pp. 294- 304 ,(1996) , 10.1117/12.240357
J.F. Kang, G.C. Xiong, G.J. Lian, Y.Y. Wang, R.Q. Han, Epitaxial growth of CeO2(100) films on Si(100) substrates by dual ion beams reactive sputtering Solid State Communications. ,vol. 108, pp. 225- 227 ,(1998) , 10.1016/S0038-1098(98)00353-6
J.M. Khoshman, A. Khan, M.E. Kordesch, Amorphous hafnium oxide thin films for antireflection optical coatings Surface & Coatings Technology. ,vol. 202, pp. 2500- 2502 ,(2008) , 10.1016/J.SURFCOAT.2007.07.095
Guanglei Tian, Shigang Wu, Kangying Shu, Laishun Qin, Jianda Shao, Influence of deposition conditions on the microstructure of oxides thin films Applied Surface Science. ,vol. 253, pp. 8782- 8787 ,(2007) , 10.1016/J.APSUSC.2007.04.073
S.G. Yoon, S.M. Kang, W.S. Jung, S.-W. Kim, D.H. Yoon, Effect of assist ion beam voltage on intrinsic stress and optical properties of Ta2O5 thin films deposited by dual ion beam sputtering Thin Solid Films. ,vol. 516, pp. 3582- 3585 ,(2008) , 10.1016/J.TSF.2007.08.051
J C Manifacier, J Gasiot, J P Fillard, A simple method for the determination of the optical constants n, k and the thickness of a weakly absorbing thin film Journal of Physics E: Scientific Instruments. ,vol. 9, pp. 1002- 1004 ,(1976) , 10.1088/0022-3735/9/11/032
Jaan Aarik, Hugo Mändar, Marco Kirm, Lembit Pung, Optical characterization of HfO2 thin films grown by atomic layer deposition Thin Solid Films. ,vol. 466, pp. 41- 47 ,(2004) , 10.1016/J.TSF.2004.01.110
Yongjin Wang, Zhilang Lin, Xinli Cheng, Haibo Xiao, Feng Zhang, Shichang Zou, Study of HfO2 thin films prepared by electron beam evaporation Applied Surface Science. ,vol. 228, pp. 93- 99 ,(2004) , 10.1016/J.APSUSC.2003.12.028