Characterization of sputtered SmCo thin films for light element contamination using RBS and HIERDA techniques
作者： James Y. Wang , Dinesh K. Sood , Muralidhar K. Ghantasala , Nick Dytlewski
DOI: 10.1016/J.VACUUM.2003.12.130
关键词: Analytical chemistry 、 Aluminium 、 Elastic recoil detection 、 Rutherford backscattering spectrometry 、 Materials science 、 Diffractometer 、 Silicon 、 Thin film 、 Sputter deposition 、 Impurity
摘要: Samarium cobalt films were prepared on silicon substrates with and without a chromium buffer layer at room temperature 600°C using direct current unbalanced magnetron sputtering. For obtaining ideal magnetic properties, the should be free from impurities, such as O, Al others. Rutherford backscattering spectrometry heavy ion elastic recoil detection analysis used to determine composition film thickness monitor light element contamination across thickness. X-ray diffractometer superconducting quantum interference device employed characterize structure properties of films, respectively. The results obtained led an improved design ground shield use sorption pump effectively minimize aluminium oxygen concentration in
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