Bias sputtering effect on ultra-thin SmCo5 films exhibiting large perpendicular coercivity

摘要: Abstract This paper reports the deposition and characterization of ultra-thin SmCo 5 films exhibiting large perpendicular coercivity under different bias sputtering conditions. The were deposited onto a Cu (20 nm)/Ti (5 nm) bilayer at 300 °C 0.5 Pa argon pressure substrate biases in range 0 to − 100 V. effect negative on stoichiometric ratio Sm/Co, surface morphology, structure magnetic properties is investigated using inductively coupled plasma atomic emission spectroscopy, force microscopy, X-ray diffractometry vibrating sample magnetometry. An intrinsic 1050 kA/m unity squareness direction film plane are achieved voltage − 60 V. ideal Co/Sm, relatively smaller grain sizes, preferred crystallographic orientation easy axis found be strong functions applied. These studies show that can significantly improved by sputtering.