Improved crystal texture control for rare earth-transition metal magnetic films sputtered in ArXe gas mixtures

作者: F.J Cadieu , H Hegde , K Chen

DOI: 10.1016/0040-6090(90)90239-A

关键词:

摘要: Abstract The influence of energetic neutral sputtered atoms impinging during the growth crystalline textured rare earth transition metal films has been experimentally studied and modeled. main system Sm 2 (Co,Fe,Cu,Zr) 17 that have directly crystallized by sputtering onto heated sapphire polycrystalline Al O 3 substrates. By varying pressures gas compositions, composition from same targets could be shifted so either a disordered hexagonal TbCu 7 -type structure was formed or, for richer samarium concentrations, 1–5-type formed. Films exhibiting were principal interest these studies. magnetic anisotropy field sufficiently high properties very sensitive indicator presence crystallites c axes skewed out film plane. It possible to sputter such films, with thicknesses 1 more than 50 microm, in-plane energy products about 20 MG Oe in ArXe mixtures no plane can detected. A result modeling which uses distribution atom energies, is fraction non-thermal striking crystallizing appreciably lowered using at much lower total if argon alone used as gas.

参考文章(12)
W. D. Westwood, Calculation of deposition rates in diode sputtering systems Journal of Vacuum Science and Technology. ,vol. 15, pp. 1- 9 ,(1978) , 10.1116/1.569429
R. E. Somekh, The thermalization of energetic atoms during the sputtering process Journal of Vacuum Science and Technology. ,vol. 2, pp. 1285- 1291 ,(1984) , 10.1116/1.572396
Reinhard Glang, Leon I. Maissel, Paul P. Budenstein, Handbook of Thin Film Technology ,(1970)
S. M. Rossnagel, Deposition and redeposition in magnetrons Journal of Vacuum Science and Technology. ,vol. 6, pp. 3049- 3054 ,(1988) , 10.1116/1.575473
F. J. Cadieu, H. Hegde, K. Chen, High‐energy product Sm‐Co‐based sputtered films, crystal texturing, and magnetic properties Journal of Applied Physics. ,vol. 67, pp. 4969- 4971 ,(1990) , 10.1063/1.344719
S. M. Rossnagel, Energetic particle bombardment of films during magnetron sputtering Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. ,vol. 7, pp. 1025- 1029 ,(1989) , 10.1116/1.576223
S. M. Rossnagel, Gas density reduction effects in magnetrons Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. ,vol. 6, pp. 19- 24 ,(1988) , 10.1116/1.574988
D. M. Mattox, Particle bombardment effects on thin‐film deposition: A review Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. ,vol. 7, pp. 1105- 1114 ,(1989) , 10.1116/1.576238
F.J. Cadieu, H. Hegde, K. Chen, The synthesis of Sm/sub 2/(Co,Fe,Zr)/sub 17/ high energy product, 16 to 30 MGOe, thick sputtered films IEEE Transactions on Magnetics. ,vol. 25, pp. 3788- 3790 ,(1989) , 10.1109/20.42612
T. Motohiro, Applications of Monte Carlo simulation in the analysis of a sputter‐deposition process Journal of Vacuum Science and Technology. ,vol. 4, pp. 189- 195 ,(1986) , 10.1116/1.573469