Reaction of titanium with germanium and silicon‐germanium alloys
作者： O. Thomas , S. Delage , F. M. d’Heurle , G. Scilla
DOI: 10.1063/1.101444
关键词:
摘要: The reaction of Ti with pure Ge and several Ge‐Si alloys has been investigated the double aim understanding throwing some light on still vexing problem Ti‐Si reaction. With one observes first all formation Ti6Ge5 until complete consumption is present. This followed by clearly identifiable nucleation TiGe2, initially forming islands that grow laterally. a 50‐50 (at. %) alloy Si Ge, distinct growth steps, but there overlap between initial phase, Ti(Ge,Si)2.
scitation.org
harvard.edu
aip.org 
sci-hub.se 参考文章(14)
R. V. Knoell, S. P. Murarka, Epitaxial growth induced by phosphorus tribromide doping of polycrystalline silicon films on silicon Journal of Applied Physics. ,vol. 57, pp. 1322- 1327 ,(1985) , 10.1063/1.334533
R Butz, GW Rubloff, TY Tan, PS Ho, None, Chemical and structural aspects of reaction at the Ti/Si interface Physical Review B. ,vol. 30, pp. 5421- 5429 ,(1984) , 10.1103/PHYSREVB.30.5421
M. Berti, A. V. Drigo, C. Cohen, J. Siejka, G. G. Bentini, R. Nipoti, S. Guerri, Titanium silicide formation: Effect of oxygen distribution in the metal film Journal of Applied Physics. ,vol. 55, pp. 3558- 3565 ,(1984) , 10.1063/1.332946
K. Maex, R.F. De Keersmaecker, M. Van Rossum, W.F. Van Der Weg, G. Krooshof, The structure and composition of layers obtained by ion beam mixing in the Ti/Si and Co/Si systems Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. ,vol. 19-20, pp. 731- 736 ,(1987) , 10.1016/S0168-583X(87)80146-5
F. M. d'Heurle, Nucleation of a new phase from the interaction of two adjacent phases: Some silicides Journal of Materials Research. ,vol. 3, pp. 167- 195 ,(1988) , 10.1557/JMR.1988.0167
Karen Holloway, Robert Sinclair, Interfacial Reactions in Titanium - Silicon Multilayers MRS Proceedings. ,vol. 77, ,(1986) , 10.1557/PROC-77-357
Pierre Villars, L. D. Calvert, Pearson's handbook of crystallographic data for intermetallic phases ,(1985)
E. D. Marshall, C. S. Wu, C. S. Pai, D. M. Scott, S. S. Lau, Metal-Germanium Contacts and Germanide Formation MRS Proceedings. ,vol. 47, pp. 161- ,(1985) , 10.1557/PROC-47-161
Robert Beyers, Robert Sinclair, Metastable phase formation in titanium‐silicon thin films Journal of Applied Physics. ,vol. 57, pp. 5240- 5245 ,(1985) , 10.1063/1.335263
Akira Kikuchi, Tsutomu Ishiba, Role of oxygen and nitrogen in the titanium‐silicon reaction Journal of Applied Physics. ,vol. 61, pp. 1891- 1894 ,(1987) , 10.1063/1.338034