Reactive sputter deposition of metal containing hydrogenated amorphous carbon coatings exhibiting self-assembled alternating nanolayers
作者： Jyh-Ming Ting , Wan-Yu Wu
DOI: 10.1016/J.SURFCOAT.2012.04.089
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摘要: Abstract A reactive magnetron sputtering deposition technique was used for the of a-C:H/Me coatings on different substrates under various conditions. Several metal targets, including Al, Si, Fe, Ni, Cu, and Pt, were used. Depending growth condition, type, substrate material, obtained found to exhibit microstructures. The conditions that favor formation alternating nanolayer structure are studied determined; therefore a processing window obtained.
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