PbTe and Pb0.8Sn0.2Te epitaxial films on cleaved BaF2 substrates prepared by a modified hot‐wall technique

作者: I. Kasai , D. W. Bassett , J. Hornung

DOI: 10.1063/1.323111

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摘要: PbTe and Pb0.8Sn0.2Te epitaxial films have been grown on cleaved BaF2 substrates by a modified hot‐wall technique. Relatively fast growth rates of 3–5 μm/h used to prepare high‐quality between 5 13 μm in thickness. Both p‐ n‐type temperature control separate Te reservoir included the apparatus. Carrier concentrations mobilities orders 2×1016–7×1017/cm3 1–3.3×104 cm2/V sec, respectively, measured as‐grown at 77 K. homojunction PbTe‐Pb0.8Sn0.2Te heterojunction layers prepared. Diode elements engraved mesa etching shown R0A products 19 38 Ω cm2 for structures

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