Asymmetric Bipolar Plasma Power Supply to Increase the Secondary Electrons Emission in Capacitive Coupling Plasmas

作者: Juliano Sadi Scholtz , Luis Cesar Fontana , Marcello Mezaroba

DOI: 10.1109/TPS.2018.2851071

关键词:

摘要: … This paper proposes an asymmetric pulsed bipolar power supply, adjustable in … of pulses for generation of cold plasmas. Short period positive pulses, between longer negative pulses, …

参考文章(23)
Youssef Magga, Christophe Dérail, Fabrice Guerton, Arnaud Ponche, Nicolas Soulem, Surface modification of polymer using AC-pulsed plasma: Optimization of the electrical parameters and characterization by contact angle and probe-tack tests Surface & Coatings Technology. ,vol. 203, pp. 1573- 1579 ,(2009) , 10.1016/J.SURFCOAT.2008.11.029
Luis Lamy Rocha, Jose Fernando Silva, Luis M. Redondo, Multilevel High-Voltage Pulse Generation Based on a New Modular Solid-State Switch IEEE Transactions on Plasma Science. ,vol. 42, pp. 2956- 2961 ,(2014) , 10.1109/TPS.2013.2296141
J. Laimer, M. Fink, T.A. Beer, H. Störi, Plasma dynamics as a key to successful upscaling of pulsed plasma processes Surface & Coatings Technology. ,vol. 174, pp. 118- 123 ,(2003) , 10.1016/S0257-8972(03)00423-7
Yong M. Kim, Jeon G. Han, Spectroscopic study for pulsed DC plasma nitriding of narrow deep holes Surface & Coatings Technology. ,vol. 171, pp. 205- 210 ,(2003) , 10.1016/S0257-8972(03)00272-X
K.E. Cooke, J. Hamsphire, W. Southall, D.G. Teer, The industrial application of pulsed DC bias power supplies in closed field unbalanced magnetron sputter ion plating Surface & Coatings Technology. ,vol. 177, pp. 789- 794 ,(2004) , 10.1016/J.SURFCOAT.2003.06.009
Yong-Xin Liu, Wei Jiang, Xiao-Song Li, Wen-Qi Lu, You-Nian Wang, An overview of diagnostic methods of low-pressure capacitively coupled plasmas Thin Solid Films. ,vol. 521, pp. 141- 145 ,(2012) , 10.1016/J.TSF.2012.02.016
W.R Bennett, Optical spectra excited in high pressure noble gases by alpha impact Annals of Physics. ,vol. 18, pp. 367- 420 ,(1962) , 10.1016/0003-4916(62)90085-4
J. L. Cecchi, L. M. Cecchi, Plasma science and technology: 50 years of progress Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. ,vol. 21, pp. S129- S130 ,(2003) , 10.1116/1.1601612