Fabrication of metallic nanostructures for investigating plasmon-induced field enhancement

摘要: High resolution metallic nanostructures with well-defined geometry, such as antennae, cones and rods, are essential for nanophotonics plasmonics. In order to fabricate structures, we use the negative electron beam resist hydrogen silsesquioxane (HSQ) an etch mask underlying metal stack. By exposing developing it in tetramethyl ammonium hydroxide (TMAH), structures dimensions of few tens nanometers can be fabricated. Afterwards surrounding is removed by ion milling. Finally, HSQ lifted off via a sacrificial chromium layer. The process was used arrays antennae different sizes, either resonant optical or infrared wavelengths. Furthermore simulations electric field vicinity were performed using finite element method.