Surface properties and microstructure of implanted TiN films using MEVVA ion source
作者： J.H. Yang , M.F. Cheng , X.D. Luo , T.H. Zhang
DOI: 10.1016/J.MSEA.2006.09.073
关键词:
摘要: Abstract The PVD–TiN film was implanted with titanium and nitrogen ions the improvement in surface wear resistance investigated. Ti ion implantation done using a metal vapor vacuum arc (MEVVA) source an dose of 2 × 10 16 ions/cm 2 at extraction voltage 48 kV. characteristics samples were measured compared performance unimplanted one by pin-on-disc apparatus optical interference microscope. structures observed X-ray photoelectron spectroscopy (XPS) transmission electron microscopy (TEM). A dynamic TRIM called as TRIDYN used to calculate concentration depth profiles TiN investigate mechanisms. results showed that improved mainly due forming nano-order crystal grains thick amorphous layer decreased local state number after implantation.
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