Ceiling plate and plasma process apparatus
作者： Tetsuya Nishizuka , Toshihisa Nozawa , Kiyotaka Ishibashi , Caizhong Tian
DOI:
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摘要: A ceiling plate provided at a portion of process chamber that may be evacuated to vacuum is disclosed. The allows microwaves emitted from slot planar antenna member along with the pass through into chamber, and includes plural protrusion portions in radial pattern on surface plate, facing toward an inside chamber.
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