Plasma processing apparatus and device manufacturing method
作者： Ryo Matsuhashi , Atsushi Sekiguchi , Hiroshi Akasaka , Naoko Matsui , Yoshimitsu Kodaira
DOI:
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摘要: The present invention provides a plasma processing apparatus which reduces damage from generated in discharge vessel and lengthen the replacement cycle of vessel. A 1 is provided with chamber 2 partitioning space, 3 whose one end opens facing inside other closed, an antenna 4 disposed around generates induced electric field to generate under reduced pressure, electromagnet 9 arranged forms divergent magnetic 3. has at closed portion protrusion 15 projecting toward 2.
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