Automated control of linear constricted plasma source array
作者： Andre Anders , Peter A. Maschwitz
DOI:
关键词:
摘要: An apparatus and method for controlling an array of constricted glow discharge chambers are disclosed. More particularly a linear plasma sources whose polarity geometry set so that the contamination energy ions discharged from minimized. The several can be mounted in parallel series to provide sustained ultra low source with below practical detection limits. quality film along deposition "tracks" opposite measured compared desired absolute or relative values by optical and/or electrical sensors. Plasma then adjusted adjusting power current values, gas feed pressure/flow, mixtures combination some all these improve match between values.
osti.gov
lens.org 参考文章(9)
Gerhard Zeissig, Klaus Goedicke, Volker Kirchhoff, Manfred Neumann, Siegfried Schiller, Nicolas Schiller, Method for plasma-assisted reactive electron beam vaporization ,(1993)
Imad Husein, Ryne C. Allen, Chung Chan, Yaunzhong Zhou, Method for the deposition and modification of thin films using a combination of vacuum arcs and plasma immersion ion implantation ,(1995)
Chung Chan, System for the plasma treatment of large area substrates ,(1997)
A Anders, S Anders, The working principle of the hollow-anode plasma source Plasma Sources Science and Technology. ,vol. 4, pp. 571- 575 ,(1995) , 10.1088/0963-0252/4/4/008
Vujo I. Miljević, Some characteristics of the hollow‐anode ion source Review of Scientific Instruments. ,vol. 63, pp. 2619- 2620 ,(1992) , 10.1063/1.1142856
V. Miljević, Hollow anode ion–electron source Review of Scientific Instruments. ,vol. 55, pp. 931- 933 ,(1984) , 10.1063/1.1137868
Vujo I. Miljević, Hollow anode ion source Review of Scientific Instruments. ,vol. 61, pp. 312- 314 ,(1990) , 10.1063/1.1141279
V. I. Miljevic, Spectroscopy of hollow anode discharge. Applied Optics. ,vol. 23, pp. 1598- 1600 ,(1984) , 10.1364/AO.23.001598
A. Anders, N. Newman, M. Rubin, M. Dickinson, E. Jones, P. Phatak, A. Gassmann, Hollow‐anode plasma source for molecular beam epitaxy of gallium nitride Review of Scientific Instruments. ,vol. 67, pp. 905- 907 ,(1996) , 10.1063/1.1146834