Method for the deposition and modification of thin films using a combination of vacuum arcs and plasma immersion ion implantation

摘要: Cathodic/anodic vacuum arc sources with plasma ion implantation deposition system for depositing high quality thin film coatings of complex compounds on a workpiece. Both cathodic and anodic sources, CAVAD, are used to create vapor from solid materials composing the cathode and/or anode in respectively. Gases, e.g., hydrogen or nitrogen can be deposited films by creating background desired gas using either RF energy, thermionic emission, consequential ionization passing through around substrate. Application highly negative pulses substrate extract ions provide them appropriate energy interact other species formation form films. The is bombarded ionized particles carbon nitrides variable [N]/[C] ratios, referred as CNx.