Cooling system for cathodic arc cathodes

作者: Scott Andrew Weaver , Reed Roeder Corderman , Don Mark Lipkin

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摘要: An apparatus for cathodic arc coating is provided. The includes: a vacuum chamber which includes an anode; power supply; and cathode target connected to the supply. has channeled back surface improving heat transfer from target. In preferred embodiment, also conductor segment connecting supply of conducting increased current capacity cooling block in contact with further improve

参考文章(3)
Subbiah Ramalingam, Cai Bao Qi, Kyunghoon Kim, Controlled vacuum arc material deposition, method and apparatus ,(1985)
Larry D. Hartsough, David J. Harra, Ronald R. Cochran, Mingwei Jiang, Internally cooled target assembly for magnetron sputtering ,(1997)