Mask image scanning exposure method
作者： John Chin-Hsiang Lin
DOI:
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摘要: A dynamic mask exposure system and method includes a support for workpiece, source of beam radiation, transmissive phase-shifting with orthogonally arranged matrices actuator lines binary pixel units which are opaque or transparent as function control inputs to the lines. The has top surface bottom surface. is connected supply signals form pattern regions regions. directed down onto mask. workpiece and/or an image detection element detecting radiation projected thereon located on support. passes through projects from where be located. In case target, there means providing representing system.
lens.org 参考文章(17)
Kenichi Kobayashi, Shougo Matsui, Test method and apparatus for a reticle or mask pattern used in semiconductor device fabrication ,(1987)
Douglas J. Cutter, Christophe Pierrat, Electrically programmable photolithography mask ,(2002)
Norman A. Peppers, Gerald A. Pierce, James R. Young, Hisami Nishi, Image correlation calculation apparatus ,(1991)
Tadao Iwaki, Yasuyuki Mitsuoka, Optical pattern recognition system method of ferroelectric liquid crystal spatial light modulator ,(1994)
David A. Markle, Natale M. Ceglio, Maskless, reticle-free, lithography ,(1996)
Martin A. van den Brink, Hans Jasper, Steve D. Slonaker, Peter Wijnhoven, Frans Klaassen, Step-and-scan and step-and-repeat: a technology comparison Proceedings of SPIE, the International Society for Optical Engineering. ,vol. 2726, pp. 734- 753 ,(1996) , 10.1117/12.240936
Gerard de Zwart, Martin A. van den Brink, Richard A. George, Danu Satriasaputra, Jan Baselmans, H. Butler, Jan B. van Schoot, Jos de Klerk, Performance of a step-and-scan system for DUV lithography Optical Microlithography X. ,vol. 3051, pp. 817- 835 ,(1997) , 10.1117/12.276002
Kazuaki Suzuki, Shinji Wakamoto, Kenji Nishi, KrF step-and-scan exposure system using higher-NA projection lens Proceedings of SPIE, the International Society for Optical Engineering. ,vol. 2726, pp. 767- 779 ,(1996) , 10.1117/12.240938
Daniel R. Cote, Keith W. Andresen, David J. Cronin, Hilary G. Harrold, Marc D. Himel, J. Kane, Joe Lyons, Louis Markoya, Christopher J. Mason, Diane C. McCafferty, Matthew E. McCarthy, Geoffrey O'Connor, Harry Sewell, David M. Williamson, Micrascan III: performance of a third-generation catadioptric step-and-scan lithographic tool Optical Microlithography X. ,vol. 3051, pp. 806- 816 ,(1997) , 10.1117/12.276001
Tsen-Hwang Lin, Jay M. Brown, Shane R. Palmer, Steven C. Gustafson, Method of exposing a light sensitive material ,(1995)