Double patterning hard mask for damascene perpendicular magnetic recording (pmr) writer
作者： Hai Sun , Hongping Yuan , Xianzhong Zeng , Yun-Fei Li , Xiaohai Xiang
DOI:
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摘要: Various embodiments of the subject disclosure provide a double patterning process that uses two steps to produce write structure having nose shape with sharp corners. In one embodiment, method for forming on multi-layer comprising substrate and an insulator layer is provided. The comprises hard mask over layer, performing first form pole yoke opening in second remove rounded corners removing portion corresponding trench filling magnetic material.
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