作者: J. J. Wierer , A. A. Allerman , E. J. Skogen , A. Tauke-Pedretti , C. Alford
DOI: 10.1063/1.4896783
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摘要: Layer disordering and doping compensation of an Al0.028Ga0.972N/AlN superlattice by implantation are demonstrated. The as-grown sample exhibits intersubband absorption at ∼1.56 μm which is modified when subject to a silicon implantation. After implantation, the decreases shifts longer wavelengths. Also, with increasing implant dose, decreases. It shown that both layer heterointerfaces from vacancies produced during cause changes in absorption. Such method useful for removing spatially defined areas III-nitride optoelectronic devices by, example, creating low-loss optical waveguides monolithically can be integrated operating as electro-absorption modulators.