σ-π molecular dielectric multilayers for low-voltage organic thin-film transistors

作者: M.-H. Yoon , A. Facchetti , T. J. Marks

DOI: 10.1073/PNAS.0501027102

关键词:

摘要: Very thin (2.3-5.5 nm) self-assembled organic dielectric multilayers have been integrated into organic thin-film transistor structures to achieve sub-1-V operating characteristics. These …

参考文章(24)
Cherie R. Kagan, Paul Andry, Thin-Film Transistors ,(2007)
John R Brews, Edward H Nicollian, Mos (Metal Oxide Semiconductor) Physics and Technology ,(1982)
B. Crone, A. Dodabalapur, Y.-Y. Lin, R. W. Filas, Z. Bao, A. LaDuca, R. Sarpeshkar, H. E. Katz, W. Li, Large-scale complementary integrated circuits based on organic transistors Nature. ,vol. 403, pp. 521- 523 ,(2000) , 10.1038/35000530
Antonio Facchetti, Myung-Han Yoon, Charlotte L. Stern, Howard E. Katz, Tobin J. Marks, Building Blocks for n-Type Organic Electronics: Regiochemically Modulated Inversion of Majority Carrier Sign in Perfluoroarene-Modified Polythiophene Semiconductors Angewandte Chemie International Edition. ,vol. 42, pp. 3900- 3903 ,(2003) , 10.1002/ANIE.200351253
C. Boulas, J. V. Davidovits, F. Rondelez, D. Vuillaume, Suppression of charge carrier tunneling through organic self-assembled monolayers. Physical Review Letters. ,vol. 76, pp. 4797- 4800 ,(1996) , 10.1103/PHYSREVLETT.76.4797
Isaac M. Rutenberg, Oren A. Scherman, Robert H. Grubbs, Weirong Jiang, Eric Garfunkel, Zhenan Bao, Synthesis of Polymer Dielectric Layers for Organic Thin Film Transistors via Surface-Initiated Ring-Opening Metathesis Polymerization Journal of the American Chemical Society. ,vol. 126, pp. 4062- 4063 ,(2004) , 10.1021/JA035773C
H. E. Katz, A. J. Lovinger, J. Johnson, C. Kloc, T. Siegrist, W. Li, Y.-Y. Lin, A. Dodabalapur, A soluble and air-stable organic semiconductor with high electron mobility Nature. ,vol. 404, pp. 478- 481 ,(2000) , 10.1038/35006603
CD Dimitrakopoulos, S Purushothaman, J Kymissis, A Callegari, JM Shaw, Low-Voltage Organic Transistors on Plastic Comprising High-Dielectric Constant Gate Insulators Science. ,vol. 283, pp. 822- 824 ,(1999) , 10.1126/SCIENCE.283.5403.822
E. K. Evangelou, C. Wiemer, M. Fanciulli, M. Sethu, W. Cranton, Electrical and structural characteristics of yttrium oxide films deposited by rf-magnetron sputtering on n-Si Journal of Applied Physics. ,vol. 94, pp. 318- 325 ,(2003) , 10.1063/1.1580644