The density effects in sputtering of amorphous materials
作者： V.I. Shulga
DOI: 10.1016/S0168-583X(00)00255-X
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摘要: Abstract The effects of the target atomic density on sputtering amorphous targets under 1 keV Ar ion bombardment have been investigated using binary-collision simulation. Attention was given to yield, and angular energy distributions sputtered atoms. A large set targets, from 3 Li 92 U considered three interatomic potentials were applied. It has shown that both yield atoms are undoubtedly dependent density. Results compared with data literature.
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