Differential pulse voltammetry of toxic metal ions at the boron-doped CVD diamond electrode

摘要: Boron-doped polycrystalline diamond films were grown over a molybdenum substrate by microwave plasma CVD process using methane and hydrogen gas mixture at pressure of 35 ± 1 Torr. Boron doping was achieved in situ solid boron source while growing the processxu. We have observed negligible background current (Δl) for differential pulse voltammetry 0.5 M NaCl, H2SO4, HNO3 solutions wide potential range. Therefore, will certainly use as an electrode material electroanalytical applications to detect trace toxic/nontoxic metal ions such cadmium, lead, copper, silver. Differential used evaluate presence lead NaCl cadmium H2SO4 supporting electrolyte solution highly conducting boron-doped coated material. Furthermore, reverse copper silver solution, respectively. Diamond has been this study metallic range that covers + 0.8 V −0.4 vs., SHE.