作者: M. Hofmann , J. Rentsch , R. Preu
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摘要: This paper gives an overview on the standard crystalline silicon solar cell manufacturing processes typically applied in industry. Main focus has been put plasma which can replace existing, mainly wet chemical within process flow. Finally, additional are presented suited for higher-efficient cells, i.e. “passivated emitter and rear cell” concept (PERC) or “heterojunction with intrinsic thin layer” approach (HIT). Plasma deposition of dielectric semiconducting layers surface passivation, anti-reflective coating purposes presented. etching removal phosphorus silicate glass parasitic emitters, wafer cleaning masked mask-free texturisation discussed.