Influence of Different CH4/N2 Ratios on Structural and Mechanical Properties of a-CNx:H Film Synthesized Using Plasma Focus
作者： Z. A. Umar , R. Ahmad , R. S. Rawat , A. Hussnain , N. Khalid
DOI: 10.1007/S10894-014-9723-4
关键词:
摘要: Carbon nitride films were synthesized by operating the dense plasma focus device with different CH4/N2 admixture gas ratios and fixed 20 shots. The pressure axial distance from anode tip kept constant at 3 mbar 8 cm respectively. Raman X-ray photoelectron spectroscopy (XPS) techniques used to observe effect of ratio on carbon bonding. XPS analysis showed that terminating group C≡N is more dominant for using higher concentration nitrogen which gives softer films. Field emission scanning electron microscopy results deposited consist nanoparticles their agglomerates. size agglomerates increases decreasing in gas. Nanoindentation increase hardness elastic modulus values found be dependent sp3 content film as well C≡N. 10.7 229.8 GPa respectively achieved deposition shots 7:3.
springer.com
sci-hub.se 参考文章(38)
A. G. Vedeshwar, Rajdeep Singh Rawat, P. Arun, Paul Choon Keat Lee, Sing Lee, Effect of energetic ion irradiation on CdI2 films Journal of Applied Physics. ,vol. 95, pp. 7725- 7730 ,(2004) , 10.1063/1.1738538
Amy Y. Liu, Marvin L. Cohen, Structural properties and electronic structure of low-compressibility materials: β-Si3N4and hypothetical β-C3N4 Physical Review B. ,vol. 41, pp. 10727- 10734 ,(1990) , 10.1103/PHYSREVB.41.10727
Anna Fallberg, Mikael Ottosson, Jan-Otto Carlsson, Phase stability and oxygen doping in the Cu–N–O system Journal of Crystal Growth. ,vol. 312, pp. 1779- 1784 ,(2010) , 10.1016/J.JCRYSGRO.2010.02.025
Z.A. Umar, R.S. Rawat, K.S. Tan, A.K. Kumar, R. Ahmad, T. Hussain, C. Kloc, Z. Chen, L. Shen, Z. Zhang, Hard TiCx/SiC/a-C:H nanocomposite thin films using pulsed high energy density plasma focus device Nuclear Instruments & Methods in Physics Research Section B-beam Interactions With Materials and Atoms. ,vol. 301, pp. 53- 61 ,(2013) , 10.1016/J.NIMB.2013.03.007
W Kies, G Decker, U Berntien, Yu V Sidelnikov, D A Glushkov, K N Koshelev, D M Simanovskii, S V Bobashev, Pinch modes produced in the SPEED2 plasma focus Plasma Sources Science and Technology. ,vol. 9, pp. 279- 287 ,(2000) , 10.1088/0963-0252/9/3/305
Z. A. Umar, R. S. Rawat, R. Ahmad, A. K. Kumar, Y. Wang, T. Hussain, Z. Chen, L. Shen, Z. Zhang, Mechanical properties of Al/a-C nanocomposite thin films synthesized using a plasma focus device Chinese Physics B. ,vol. 23, pp. 025204- ,(2014) , 10.1088/1674-1056/23/2/025204
X.‐A. Zhao, C. W. Ong, Y. C. Tsang, Y. W. Wong, P. W. Chan, C. L. Choy, Reactive pulsed laser deposition of CNx films Applied Physics Letters. ,vol. 66, pp. 2652- 2654 ,(1995) , 10.1063/1.113114
M. Valipour, M. A. Mohammadi, S. Sobhanian, R. S. Rawat, Increasing of Hardness of Titanium Using Energetic Nitrogen Ions from Sahand as a Filippov Type Plasma Focus Facility Journal of Fusion Energy. ,vol. 31, pp. 65- 72 ,(2012) , 10.1007/S10894-011-9432-1
Y.H Cheng, X.L Qiao, J.G Chen, Y.P Wu, C.S Xie, Y.Q Wang, D.S Xu, S.B Mo, Y.B Sun, Dependence of the composition and bonding structure of carbon nitride films deposited by direct current plasma assisted pulsed laser ablation on the deposition temperature Diamond and Related Materials. ,vol. 11, pp. 1511- 1517 ,(2002) , 10.1016/S0925-9635(02)00055-9
M.T. Hosseinnejad, M. Ghoranneviss, G.R. Etaati, M. Shirazi, Z. Ghorannevis, Deposition of tungsten nitride thin films by plasma focus device at different axial and angular positions Applied Surface Science. ,vol. 257, pp. 7653- 7658 ,(2011) , 10.1016/J.APSUSC.2011.03.155