Plasma processor with coil having variable rf coupling
作者： John P. Holland , Tiqiang Ni , Wenli Collison
DOI:
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摘要: A coil for exciting an r.f. plasma in a vacuum processing chamber includes plural radially and circumferentially extending turns connected between pair of excitation terminals. In one embodiment, drive mechanism varies field coupling coefficients different radial circumferential portions the plasma. The shafts which toward away from second drives shield having at least moving part intercepting portion derived by coil.
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