Method and apparatus for producing magnetically-coupled planar plasma
作者： John Seldon Ogle
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摘要: An apparatus for producing a planar plasma in low pressure process gas includes chamber and an external coil. Radiofrequency resonant current is induced the coil which turn produces magnetic field within exclosure. The causes circulating flux of electrons region ionic radical species. system may be used treatment variety articles, typically semiconductor wafers are oriented parallel to enclosure.
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