Multiple electron-beam lithography
作者： T.H.P. Chang , Marian Mankos , Kim Y. Lee , Larry P. Muray
DOI: 10.1016/S0167-9317(01)00528-7
关键词:
摘要: … Adaptation of thin layer imaging (TLI) techniques for low kV e-beam exposure is used to meet the objective … E-beam exposure is performed at 1 kV at a dose between 1 and 20 μC/cm 2 . …
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