Evolution of target condition in reactive HiPIMS as a function of duty cycle: An opportunity for refractive index grading
作者： Rajesh Ganesan , Behnam Akhavan , James G. Partridge , Dougal G. McCulloch , David R. McKenzie
DOI: 10.1063/1.4977824
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摘要: Competition between target erosion and compound layer formation during pulse cycles in reactive HiPIMS opens up the possibility of tuning discharge conditions properties deposited films by varying duty cycle situ without altering gas mixture. Three different systems, hafnium oxygen, tungsten oxygen/nitrogen, are studied which amorphous oxide (HfO2), (WO3), oxynitride (WOxNy) deposited. We show that cyclic evolution surface composition depends on including its affinity for mix melting point volatility. find length variations modulate hence chemistry The refractive indices HfO2 WO3 were progressively reduced with cycle, whereas WOxNy increased. These found to be d...
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Nikita Aleksandrovich Toropov, Valentin Pavlovich Barzakovskii, Evaporation of High-Temperature Oxides of Group IV–VI Elements Springer, Boston, MA. pp. 177- 206 ,(1966) , 10.1007/978-1-4684-7209-7_10
J. Vlček, A. Belosludtsev, J. Rezek, J. Houška, J. Čapek, R. Čerstvý, S. Haviar, High-rate reactive high-power impulse magnetron sputtering of hard and optically transparent HfO2 films Surface & Coatings Technology. ,vol. 290, pp. 58- 64 ,(2016) , 10.1016/J.SURFCOAT.2015.08.024
O.R. Nunez, A.J. Moreno Tarango, N.R. Murphy, L.C. Phinney, K. Hossain, C.V. Ramana, Physical characterization of sputter-deposited amorphous tungsten oxynitride thin films Thin Solid Films. ,vol. 596, pp. 160- 166 ,(2015) , 10.1016/J.TSF.2015.08.066
B. J. Murdoch, R. Ganesan, D. R. McKenzie, M. M. M. Bilek, D. G. McCulloch, J. G. Partridge, Influence of nitrogen-related defects on optical and electrical behaviour in HfO2-xNx deposited by high-power impulse magnetron sputtering Applied Physics Letters. ,vol. 107, pp. 112903- ,(2015) , 10.1063/1.4931099
A. Subrahmanyam, A. Karuppasamy, Optical and electrochromic properties of oxygen sputtered tungsten oxide (WO3) thin films Solar Energy Materials and Solar Cells. ,vol. 91, pp. 266- 274 ,(2007) , 10.1016/J.SOLMAT.2006.09.005
D. Depla, R. De Gryse, Target poisoning during reactive magnetron sputtering: Part II: the influence of chemisorption and gettering Surface and Coatings Technology. ,vol. 183, pp. 190- 195 ,(2004) , 10.1016/J.SURFCOAT.2003.10.007
S. H. Mohamed, O. Kappertz, J. M. Ngaruiya, T. Niemeier, R. Drese, R. Detemple, M. M. Wakkad, M. Wuttig, Influence of nitrogen content on properties of direct current sputtered TiOxNy films physica status solidi (a). ,vol. 201, pp. 90- 102 ,(2004) , 10.1002/PSSA.200306707
Axel Hemberg, Jean-Pierre Dauchot, Rony Snyders, Stephanos Konstantinidis, Evaporation-assisted high-power impulse magnetron sputtering: The deposition of tungsten oxide as a case study Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. ,vol. 30, pp. 040604- ,(2012) , 10.1116/1.4722728
D. Depla, R. De Gryse, Target poisoning during reactive magnetron sputtering: Part III: the prediction of the critical reactive gas mole fraction Surface and Coatings Technology. ,vol. 183, pp. 196- 203 ,(2004) , 10.1016/J.SURFCOAT.2003.10.008
T. W. H. Oates, D. R. McKenzie, M. M. M. Bilek, Percolation threshold in ultrathin titanium films determined by in situ spectroscopic ellipsometry Physical Review B. ,vol. 70, pp. 195406- ,(2004) , 10.1103/PHYSREVB.70.195406