Carbon films deposited by mixed-mode high power impulse magnetron sputtering for high wear resistance: The role of argon incorporation

摘要: Abstract Amorphous carbon thin films with high hardness and wear resistance have become increasingly popular for surface engineering of materials an array applications ranging from cutting tools to biomedical devices. For any practical application, such must resist delamination the substrate under load. High power impulse magnetron sputtering (HiPIMS) provides opportunity fabricate a wide range sp3 fractions thus tuned mechanical properties. Here we used process mixed mode HiPIMS transition arc deposit amorphous hardness-to-elasticity (H/E) ratio, parameter that is often as measure resistance. We deposition rate content argon in by varying either frequency pulses or substrate-to-target distance. In both cases, increased increases rate. Increasing content, H/E while fraction residual stress decreased. Our results suggest bombardment induces dynamic annealing effect films. showed does not vary substantially increasing temperature alone, decreases temperatures higher than 120 °C. Deposition at frequencies therefore recommended approach synthesis resistant films, determined ratio.