Effects of Granularity of Complementary Patterns in a Capacity-Equalized Mold Used for UV Nanoimprint Lithography

摘要: It is a key issue to obtain uniform residual layer for feature of non-uniform pattern densities when applying nanoimprint. To treat this issue, it proposed use capacity-equalized mold, in which deeper complementary cavities are added the original trench areas order make capacity per unit area throughout entire mold varying densities, but without altering layout. In work, we introduced new concept granularity characterize denseness patterns. The effects patterns were investigated whose corresponding have densities. was found that thicknesses could hold same values at with different granularities mold. understand effects, an in-situ resist filling process studied using video system. We time increased increasing granularity. bubbles trapped mainly shrank along directions lines, while their widths vertical lines remained almost unchanged until end disappeared.