Dangling bonds on silicon

作者: B. P. Lemke , D. Haneman

DOI: 10.1103/PHYSREVB.17.1893

关键词:

摘要: The electron-paramagnetic-resonance signal that appears when Si is crushed, cleaved, or abraded shown to be proportional the areas of microcracks induced in specimen. These are more prevalent than previously realized. Detailed consideration shows a wide variety inexplicable data can now understood. include some effects oxygen and hydrogen, variability width, abrasive particle size, kind cleavage. origin unpaired electrons considered it concluded they may localized states on surfaces microcracks, such being apparently case Anderson localization. atoms crack subject spatially varying overlap forces stress fields whose energy range exceeds normal bandwidth, thus inducing temperature dependence paramagnetism discussed, including correlation corrections, yield approximately ${T}^{\ensuremath{-}1}$ as observed experimentally. A similar explanation applies Ge. Cleancleaved display negligible surface due pairing alternate atom sites. results suggest for amorphous Ge, small aggregates should possible source paramagnetism.

参考文章(54)
D. Haneman, Review of Electron Paramagnetic Resonance Investigations of Semiconductor Surfaces Japanese Journal of Applied Physics. ,vol. 13, pp. 371- ,(1974) , 10.7567/JJAPS.2S2.371
M. Schlüter, James R. Chelikowsky, Steven G. Louie, Marvin L. Cohen, Self-consistent pseudopotential calculations for Si (111) surfaces: Unreconstructed (1×1) and reconstructed (2×1) model structures Physical Review B. ,vol. 12, pp. 4200- 4214 ,(1975) , 10.1103/PHYSREVB.12.4200
D. Kaplan, D. Lépine, Y. Petroff, P. Thirry, New ESR Investigation of the Cleaved-Silicon Surface Physical Review Letters. ,vol. 35, pp. 1376- 1379 ,(1975) , 10.1103/PHYSREVLETT.35.1376
B. P. Lemke, D. Haneman, Low-Temperature EPR Measurements onin situVacuum-Cleaved Silicon Physical Review Letters. ,vol. 35, pp. 1379- 1382 ,(1975) , 10.1103/PHYSREVLETT.35.1379
M. F. Chung, D. Haneman, Properties of Clean Silicon Surfaces by Paramagnetic Resonance Journal of Applied Physics. ,vol. 37, pp. 1879- 1889 ,(1966) , 10.1063/1.1708618
M.F. Chung, The effects of bulk doping on the ESR signal of clean Si surfaces Journal of Physics and Chemistry of Solids. ,vol. 32, pp. 475- 485 ,(1971) , 10.1016/0022-3697(71)90032-1
H. Ibach, J.E. Rowe, Hydrogen adsorption and surface structures of silicon Surface Science. ,vol. 43, pp. 481- 492 ,(1974) , 10.1016/0039-6028(74)90271-4
L. F. Wagner, W. E. Spicer, Photoemission study of the effect of bulk doping and oxygen exposure on silicon surface states Physical Review B. ,vol. 9, pp. 1512- 1515 ,(1974) , 10.1103/PHYSREVB.9.1512
D. J. Miller, D. L. Heron, D. Haneman, Semiconductor Surface States Considered on the Hubbard Model; Correlation with Electron Paramagnetic Resonance Data Journal of Vacuum Science and Technology. ,vol. 9, pp. 906- 910 ,(1972) , 10.1116/1.1317817