摘要: A multilayer technique for evaporation of Ohmic contacts onto CdS is described. The electrical properties these do not change markedly after vacuum heat treatment up to 350°C. This consists a sequential preparative layer, an active metal and possibly covering metal. Ti (preparative)‐Al (active)‐Pt (cover) sequence has been found most successful. All the more than forty evaporations investigated on single crystals, or evaporated recrystallized layers, showed characteristics between 2 mV 200 V only generation‐recombination noise above (at most) 300 Hz.