Thermal conductivity and sound velocity measurements of plasma enhanced chemical vapor deposited a-SiC:H thin films
作者： D.B. Hondongwa , L.R. Olasov , B.C. Daly , S.W. King , J. Bielefeld
DOI: 10.1016/J.TSF.2011.05.014
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摘要: Abstract We report ultrafast optical measurements of the thermal conductivity and longitudinal sound velocity for a-SiC:H thin films deposited by plasma enhanced chemical vapor deposition (PECVD). Porous non-porous with mass densities ranging from 1.0–2.5 g/cm3 were obtained intentionally varying PECVD process conditions. The velocities these materials as determined picosecond ultrasonics ranged 2370 m/s to 10460 m/s, Young's modulus 5–200 GPa. Time domain thermoreflectance range 0.0009 W/cmK 0.042 W/cmK.
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