Electric field alignment of a block copolymer nanopattern: direct observation of the microscopic mechanism.

摘要: Using quasi-in-situ scanning force microscopy we study the details of nanopattern alignment in ABC terblock copolymer thin films presence an in-plane electric field. Because surface interactions and field lamellae are oriented both perpendicular to plane film parallel We identified two distinct defect types which govern orientation mechanism. Ring-like (tori) open-end defects dominate at early stage process, while mainly classic topological (disclinations dislocations) involved long-range ordering late stages. Comparison time evolution density with orientational order parameter suggests that tori-defects essential for effective reorientation. Further, SFM imaging allowed us elucidate influence strength on propagation velocity defects.