Mechanism and dynamics of block copolymer directed assembly with density multiplication on chemically patterned surfaces
作者： Guoliang Liu , Sean P Delcambre , Karl O Stuen , Gordon SW Craig , Juan J De Pablo
DOI: 10.1116/1.3518918
关键词:
摘要: In this work, we used scanning electron microscopy (SEM), in situ coherent small angle x-ray scattering (SAXS), and Monte Carlo molecular simulation to gain insights into the dynamics of block copolymer directed assembly with density multiplication on chemically patterned surfaces. During assembly, it was observed SEM that poly(styrene-block-methyl methacrylate) initially formed discrete polystyrene domains lacked long-range order at free surface. After further annealing, gradually coalesced linear were not registered fully underlying chemical pattern. The could be trapped metastable morphologies. Finally, perpendicular lamellae full registration It revealed SAXS peaks characteristic period pattern appeared disappeared early stages assembly. morphological evolutio...
scitation.org
aip.org
sci-hub.se 参考文章(35)
Violetta Olszowka, Markus Hund, Volker Kuntermann, Sabine Scherdel, Larisa Tsarkova, Alexander Böker, Electric field alignment of a block copolymer nanopattern: direct observation of the microscopic mechanism. ACS Nano. ,vol. 3, pp. 1091- 1096 ,(2009) , 10.1021/NN900081U
Guoliang Liu, Shengxiang Ji, Karl O. Stuen, Gordon S. W. Craig, Paul F. Nealey, F. J. Himpsel, Modification of a polystyrene brush layer by insertion of poly(methyl methacrylate) molecules Journal of Vacuum Science & Technology B. ,vol. 27, pp. 3038- 3042 ,(2009) , 10.1116/1.3253607
Eunhye Kim, Hyungju Ahn, Du Yeol Ryu, Jehan Kim, Junhan Cho, Transition Behavior of Weakly Interacting PS-b-PMMA Films on Preferential Surfaces: A Direct Observation by GISAXS Macromolecules. ,vol. 42, pp. 8385- 8391 ,(2009) , 10.1021/MA901399V
Sang Ouk Kim, Harun H Solak, Mark P Stoykovich, Nicola J Ferrier, Juan J De Pablo, Paul F Nealey, None, Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates Nature. ,vol. 424, pp. 411- 414 ,(2003) , 10.1038/NATURE01775
Gregg M. Wilmes, David A. Durkee, Nitash P. Balsara, J. Alexander Liddle, Bending Soft Block Copolymer Nanostructures by Lithographically Directed Assembly Macromolecules. ,vol. 39, pp. 2435- 2437 ,(2006) , 10.1021/MA0526443
Larisa Tsarkova, Armin Knoll, Robert Magerle, Rapid transitions between defect configurations in a block copolymer melt. Nano Letters. ,vol. 6, pp. 1574- 1577 ,(2006) , 10.1021/NL060825S
J. Y. Cheng, C. A. Ross, H. I. Smith, E. L. Thomas, Templated Self‐Assembly of Block Copolymers: Top‐Down Helps Bottom‐Up Advanced Materials. ,vol. 18, pp. 2505- 2521 ,(2006) , 10.1002/ADMA.200502651
Ion Bita, Joel KW Yang, Yeon Sik Jung, Caroline A Ross, Edwin L Thomas, Karl K Berggren, None, Graphoepitaxy of self-assembled block copolymers on two-dimensional periodic patterned templates. Science. ,vol. 321, pp. 939- 943 ,(2008) , 10.1126/SCIENCE.1159352
E. W. Edwards, M. F. Montague, H. H. Solak, C. J. Hawker, P. F. Nealey, Precise Control over Molecular Dimensions of Block‐Copolymer Domains Using the Interfacial Energy of Chemically Nanopatterned Substrates Advanced Materials. ,vol. 16, pp. 1315- 1319 ,(2004) , 10.1002/ADMA.200400763
Kostas Ch Daoulas, Marcus Müller, Mark P Stoykovich, Huiman Kang, Juan J de Pablo, Paul F Nealey, None, Directed Copolymer Assembly on Chemical Substrate Patterns: A Phenomenological and Single-Chain-in-Mean-Field Simulations Study of the Influence of Roughness in the Substrate Pattern† Langmuir. ,vol. 24, pp. 1284- 1295 ,(2008) , 10.1021/LA702482Z