Effect of deposition temperature on microstructure and corrosion resistance of ZrN thin films deposited by DC reactive magnetron sputtering

作者: Daiane Roman , Juliane Bernardi , Cintia L.G. de Amorim , Fernando S. de Souza , Almir Spinelli

DOI: 10.1016/J.MATCHEMPHYS.2011.06.013

关键词:

摘要: … As pointed by Oh and Je [33], the surface energy is dominant in the early stage of film growth, in which the (2 0 0) plane has the lowest surface energy and grows faster than other planes…

参考文章(34)
Charles S. Barrett, Structure of Metals ,(2007)
Leif I. Johansson, H.I.P. Johansson, A Core Level Study of ZrN (100) and NbN (100) Materials Science Forum. pp. 335- 340 ,(2000) , 10.4028/WWW.SCIENTIFIC.NET/MSF.325-326.335
E.W. Niu, L. Li, G.H. Lv, H. Chen, X.Z. Li, X.Z. Yang, S.Z. Yang, Characterization of Ti–Zr–N films deposited by cathodic vacuum arc with different substrate bias Applied Surface Science. ,vol. 254, pp. 3909- 3914 ,(2008) , 10.1016/J.APSUSC.2007.12.022
G. Abadias, Stress and preferred orientation in nitride-based PVD coatings Surface & Coatings Technology. ,vol. 202, pp. 2223- 2235 ,(2008) , 10.1016/J.SURFCOAT.2007.08.029
Hugues Wiame, Miguel-Angel Centeno, Sandra Picard, Philippe Bastians, Paul Grange, Thermal oxidation under oxygen of zirconium nitride studied by XPS, DRIFTS, TG-MS Journal of the European Ceramic Society. ,vol. 18, pp. 1293- 1299 ,(1998) , 10.1016/S0955-2219(98)00056-9
M. Del Re, R. Gouttebaron, J.-P. Dauchot, P. Leclère, G. Terwagne, M. Hecq, Study of ZrN layers deposited by reactive magnetron sputtering Surface & Coatings Technology. ,vol. 174, pp. 240- 245 ,(2003) , 10.1016/S0257-8972(03)00679-0
U. C. Oh, Jung Ho Je, Effects of strain energy on the preferred orientation of TiN thin films Journal of Applied Physics. ,vol. 74, pp. 1692- 1696 ,(1993) , 10.1063/1.355297
P. Prieto, L. Galán, J. M. Sanz, Electronic structure of insulating zirconium nitride. Physical Review B. ,vol. 47, pp. 1613- 1615 ,(1993) , 10.1103/PHYSREVB.47.1613
A. Rizzo, M. A. Signore, L. Mirenghi, D. Dimaio, Deposition and properties of ZrNx films produced by radio frequency reactive magnetron sputtering Thin Solid Films. ,vol. 515, pp. 1486- 1493 ,(2006) , 10.1016/J.TSF.2006.04.012
M.A. Signore, A. Rizzo, L. Mirenghi, M.A. Tagliente, A. Cappello, Characterization of zirconium oxynitride films obtained by radio frequency magnetron reactive sputtering Thin Solid Films. ,vol. 515, pp. 6798- 6804 ,(2007) , 10.1016/J.TSF.2007.02.033