Semiconductor device and electronic device including the semiconductor device
作者： Tetsuhiro Tanaka
DOI:
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摘要: In a semiconductor device including transistor, an oxygen release type oxide insulating film is formed in contact with channel formation region of the transistor. The film. Oxygen supplied from to Further, bather which penetrates around region, whereby diffusion wiring, electrode, and like connected transistor can be suppressed.
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