Pressure effects in ZnO films using off-axis sputtering deposition
作者： Shen Zhu , C.-H Su , S.L Lehoczky , P Peters , M.A George
DOI: 10.1016/S0022-0248(99)00798-8
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摘要: Abstract ZnO films are deposited on (0 0 0 1) sapphire and quartz substrates using the off-axis reactive magnetron sputtering deposition. Based film thickness measurements, three transport regions of sputtered particles observed when in pressure 5–150 mTorr. X-ray diffraction, scanning probes microscopy, electrical measurements also used to characterize these films. The full-width at half-maximum θ-rocking curves for epitaxial is less than 0.5°. In textured films, it rises several degrees. high reveal a flat surface with some hexagonal facets. density facets decreases growth reduced. resistivity depends pressures. A relationship between effects properties discussed.
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