PLASMA REACTION TREATMENT DEVICE

摘要: PURPOSE:To shorten the removal treatment time of a deteriorated organic film and speed up etching by arranging two small chambers at main frame chamber preparing cylindrical electrode connecting to high frequency power source one also split as well that is grounded other chambers. CONSTITUTION:A 2 composed pair 4 5 which are integrally formed on 3. A reaction gas introduced from introducing tube 11 into inside waves impressed 6 changing switch 7. Then plasma produced between lower 15 wafer W exposed principal region producing plasma. Once surface layer part an removed after passing prescribed time, 9 again Then, moved 3 left removed.