Where Is The Lost Resolution

摘要: In addition to raising the numerical aperture of imaging lens or reducing exposing wavelength improve resolution in optical lithography, a third direction is pursued, namely restoration potential capability that lost due incorrect practice. Unlike former two methods, gain depth focus can accompany improvement resolution. this paper, elimination vibration between mask and wafer, resist contrast improvement, multilayer systems are cited as possible means for improvement. Simulation study given on effects quantitatively assess improvements.