摘要: A lithographic process capable of manufacturing state the art chips faces many difficult challenges. Not only must resolve minimum feature size but overlay errors be held to tight tolerances, exquisitely complex patterns printed with high yield, and overall cost acceptable. Achieving acceptable chip using an expensive exposure tool is strongly linked throughput, this in turn resist processes sensitivity. In recent years, chemically amplified have dominated state-of-the-art production because their resolution excellent This article will consider limitations for lithography, both limits itself process. Among most important considerations tradeoff between sensitivity resolution. Fundamental reasons underlying success optical lithography integrated circuits described. These illuminate challenges opportunities future methods.